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Optimization of thin films of metal oxide materials
Vítek, Jiří ; Šimonová, Lucie (referee) ; Šubarda, Jiří (advisor)
This thesis is focused on the description of the method of reactive sputtering of thin films. Currently, there are many ways how to create thin films and there are many applications of thin films in various industrial sectors. In this paper at the first are listed the issue of thin films, followed by an overview of the deposition techniques and of the chemical analysis of deposited thin films. It also describes the four-point measurement method of sheet resistance, mechanical test of adhesion and optical properties. At the end of the theoretical part are described the material composition of the deposited films. The goal of the practical part is to optimize the deposition process of the mixed layer of indium tin oxide (In2O3: SnO2) and contribute to the overall understanding of the influence of annealing on the layer. There were created six series of samples with that applied layers. First, the work focused on examining of the influence of annealing on the throughput in the whole measuring range, and then comparing the series due to the transmittance in the visible light spectrum. Furthermore were compared the value of sheet resistance of unannealed and subsequently annealed samples.
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Optimization of thin films of metal oxide materials
Vítek, Jiří ; Šimonová, Lucie (referee) ; Šubarda, Jiří (advisor)
This thesis is focused on the description of the method of reactive sputtering of thin films. Currently, there are many ways how to create thin films and there are many applications of thin films in various industrial sectors. In this paper at the first are listed the issue of thin films, followed by an overview of the deposition techniques and of the chemical analysis of deposited thin films. It also describes the four-point measurement method of sheet resistance, mechanical test of adhesion and optical properties. At the end of the theoretical part are described the material composition of the deposited films. The goal of the practical part is to optimize the deposition process of the mixed layer of indium tin oxide (In2O3: SnO2) and contribute to the overall understanding of the influence of annealing on the layer. There were created six series of samples with that applied layers. First, the work focused on examining of the influence of annealing on the throughput in the whole measuring range, and then comparing the series due to the transmittance in the visible light spectrum. Furthermore were compared the value of sheet resistance of unannealed and subsequently annealed samples.
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Deposition methods of thin films using low-temperature plasma
GÜNZEL, Martin
This thesis is focused on the description of selected deposition methods of thin films using low-temperature plasma. Currently, many various technologies of thin films are developed and there are many applications in various industrial sectors. This thesis first gives a brief overview of deposition methods, plasma behavior during deposition and subsequent description of the selected methods of application due to the physical and chemical processes. They also discussed the advantages and disadvantages of the described coating technologies, and several examples of their use. The thesis should thus contribute to the overall view of modern coating technologies, their development and use currently, or possible use in the future.
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